• DocumentCode
    1978801
  • Title

    A high power long pulse RF-driven H- source

  • Author

    Kwan, J.W. ; Ackerman, G.D. ; Cooper, W.S. ; deVries, G.J. ; Leung, K.N. ; Wells, R.P.

  • Author_Institution
    Lawrence Berkeley Lab., California Univ., Berkeley, CA, USA
  • fYear
    1993
  • fDate
    17-20 May 1993
  • Firstpage
    3169
  • Abstract
    We have tested the radio-frequency driven H- source and have shown that the H- production efficiency and the beam emittance are similar to those obtained from the filament discharge. Typically the numbers are 2.8 mA/cm2/kW and 0.017 π-mrad-cm (which corresponds to 1.9 eV) respectively. So far we have operated RF pulses of ≈10 kW for ≈50 ms with a porcelain-coated antenna and ≈15 kW for ≈1 s with additional layers of quartz sleeving. It is necessary to develop better antenna coating material that can withstand the intense plasma heating and sputtering in order to operate at higher power with longer pulse length
  • Keywords
    ion sources; 1 s; 1.9 eV; 10 kW; 15 kW; 50 ms; H; H- production efficiency; RF-driven H- source; antenna coating material; beam emittance; high power; long pulse; porcelain-coated antenna; Apertures; Circuits; Current transformers; Electron beams; Fault location; Ion sources; Plasma measurements; Power supplies; Production; Radio frequency;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Particle Accelerator Conference, 1993., Proceedings of the 1993
  • Conference_Location
    Washington, DC
  • Print_ISBN
    0-7803-1203-1
  • Type

    conf

  • DOI
    10.1109/PAC.1993.309589
  • Filename
    309589
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1978801