Title :
Impact of nanoimprint lithography to device development
Author :
Chou, Stephen Y.
Author_Institution :
Dept. of Electr. Eng., Princeton Univ., NJ, USA
Abstract :
In this paper, we review the status of nanoimprint lithography and its applications in nanodevices. In addition to sub-10 nm resolution, 3D patterning, and applications in other areas, we particularly discuss the fabrication of nanotransistors and circuits on 4 wafers using NIL at all lithography level and the fabrication of room temperature Si single electron transistors.
Keywords :
elemental semiconductors; nanolithography; silicon; single electron transistors; 10 nm; 293 to 298 K; 3D patterning; Si; Si single electron transistors; circuits fabrications; nanodevices applications; nanoimprint lithography; nanotransistors fabrications; room temperature; Costs; Fabrication; Laboratories; Lithography; Manufacturing; Nanolithography; Optical materials; Research and development; Resists; Throughput;
Conference_Titel :
Device Research Conference, 2003
Print_ISBN :
0-7803-7727-3
DOI :
10.1109/DRC.2003.1226849
