DocumentCode :
1980417
Title :
High speed lateral trench detectors with a junction substrate
Author :
Qiqing Ouyang ; Schaub, J.D.
Author_Institution :
IBM Div. of Res., Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
fYear :
2003
fDate :
23-25 June 2003
Firstpage :
73
Lastpage :
74
Abstract :
In this paper, we propose a junction-substrate LTD structure. Two-dimensional device simulations indicate that the built-in electric field created by the buried junction can effectively block the deep carriers and increase the bandwidth. The buried p-n junction can be realized by conventional techniques such as epitaxy. Preliminary experimental results show significant enhancement in bandwidths in such devices. Further device simulations show that a 50/spl mu/m diameter device can achieve a transit time limited bandwidth in excess of 10GHz with an optimized design.
Keywords :
electric field effects; elemental semiconductors; photodetectors; photodiodes; semiconductor device models; silicon; 10 GHz; 50 micron; Si; buried p-n junction; deep carriers; electric field; epitaxy methods; high speed lateral trench detectors; junction substrate; transit time limited bandwidth; two-dimensional device simulations; Absorption; Bandwidth; Biomedical optical imaging; Detectors; Doping; Frequency response; High speed optical techniques; Medical simulation; Research and development; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2003
Conference_Location :
Salt Lake City, UT, USA
Print_ISBN :
0-7803-7727-3
Type :
conf
DOI :
10.1109/DRC.2003.1226878
Filename :
1226878
Link To Document :
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