Title :
Manufacturing method of high frequency quartz oscillators over 1 GHz
Author :
Nagaura, Yoshiaki ; Yokomizo, Seiichi
Author_Institution :
Nagaura Lab. Co. Inc., Fukuoka, Japan
Abstract :
In addition to the conventional methods of chemical etching and mechanical polishing, reactive ion etching (RIE) is proposed as a major production method of high frequency quartz oscillators. We have found that RIE, with the selection of a condition, is useful in the production of quartz oscillators, and that mechanical polishing is effective for the improvement of the characteristic
Keywords :
UHF oscillators; crystal oscillators; electron device manufacture; polishing; sputter etching; 1 GHz; HF quartz oscillators; RIE; SiO2; high frequency quartz oscillators; manufacturing method; mechanical polishing; production method; reactive ion etching; Chemical processes; Chemical products; Electric variables; Frequency; Machining; Manufacturing; Oscillators; Production; Sputter etching; Sputtering;
Conference_Titel :
Frequency and Time Forum, 1999 and the IEEE International Frequency Control Symposium, 1999., Proceedings of the 1999 Joint Meeting of the European
Conference_Location :
Besancon
Print_ISBN :
0-7803-5400-1
DOI :
10.1109/FREQ.1999.840797
