DocumentCode :
1980459
Title :
Influence of surface structure on electrical characteristics in SiC MESFETs
Author :
Ho-Young Cha ; Thomas, C.I. ; Eastman, L.F. ; Spencer, M.G.
Author_Institution :
Sch. of Electr. & Comput. Eng., Cornell Univ., Ithaca, NY, USA
fYear :
2003
fDate :
23-25 June 2003
Firstpage :
77
Lastpage :
78
Abstract :
In this paper, the influence of surface structure on SiC MESFETs has been studied by investigating electrical characteristics, such as DC, small signal, and large signal characteristics. Three different structures have been fabricated and compared with each other:channel-recessed, gate-recessed, and buried gate structures.
Keywords :
power MESFET; semiconductor epitaxial layers; silicon compounds; surface structure; wide band gap semiconductors; DC; SiC; SiC MESFETs; buried gate structures; channel-recessed structures; electrical properties; gate-recessed structures; large signal; small signal; surface structure; Electric variables; MESFETs; Passivation; Performance evaluation; Power generation; Power measurement; Radio frequency; Silicon carbide; Surface structures; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2003
Conference_Location :
Salt Lake City, UT, USA
Print_ISBN :
0-7803-7727-3
Type :
conf
DOI :
10.1109/DRC.2003.1226880
Filename :
1226880
Link To Document :
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