DocumentCode :
1981090
Title :
Photo- and Cathodo- luminescence of hydrogenated Silicon Rich Oxide
Author :
López-Estopier, R. ; Aceves-Mijares, M. ; Yu, Z. ; Zuñiga, C. ; Falcony, C.
Author_Institution :
Dept. of Electron., INAOE, Puebla
fYear :
2008
fDate :
12-14 Nov. 2008
Firstpage :
489
Lastpage :
494
Abstract :
Photoluminescence and Cathodoluminescence of hydrogenated Silicon Rich Oxide (SRO:H) films were studied. The samples were prepared by Low Pressure Chemical Vapor Deposition (LPCVD) on Si substrates, some samples were thermally annealed at high temperature and hydrogenation was made by low temperature annealing in forming gas. Strong red PL (Photoluminescence) and CL (Cathodoluminescence) in almost all the visible range were obtained. It was found that it is necessary to apply thermal treatment at high temperatures in order to obtain strong Photo and Cathodo-luminescence. Samples with lower silicon excess show maximum luminescence (CL and PL) while samples with higher silicon excess show poor luminescence. The hydrogen promotes the PL emission, but electron beam irradiation (after CL measurements) quenches the red band observed by PL. The results are analyzed to find the dependency of the PL and CL with respect to hydrogenation, silicon excess and thermal treatment. An explanation is presented in order to interpret these experimental results.
Keywords :
annealing; cathodoluminescence; electron beam effects; hydrogen; hydrogenation; infrared spectra; phase separation; photoluminescence; silicon compounds; stoichiometry; thin films; Si; SiOx:H; cathodoluminescence; electron beam irradiation; hydrogenated films; hydrogenation; infrared absorption spectra; low pressure chemical vapor deposition; low temperature annealing; phase separation; photoluminescence; stoichiometry; thermal treatment; Annealing; Chemical vapor deposition; Electron beams; Hydrogen; Luminescence; Photoluminescence; Semiconductor films; Silicon; Temperature; Thermal quenching; Cathodoluminescence; Photoluminescence; Silicon Rich Oxide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Engineering, Computing Science and Automatic Control, 2008. CCE 2008. 5th International Conference on
Conference_Location :
Mexico City
Print_ISBN :
978-1-4244-2498-6
Electronic_ISBN :
978-1-4244-2499-3
Type :
conf
DOI :
10.1109/ICEEE.2008.4723390
Filename :
4723390
Link To Document :
بازگشت