DocumentCode
1981090
Title
Photo- and Cathodo- luminescence of hydrogenated Silicon Rich Oxide
Author
López-Estopier, R. ; Aceves-Mijares, M. ; Yu, Z. ; Zuñiga, C. ; Falcony, C.
Author_Institution
Dept. of Electron., INAOE, Puebla
fYear
2008
fDate
12-14 Nov. 2008
Firstpage
489
Lastpage
494
Abstract
Photoluminescence and Cathodoluminescence of hydrogenated Silicon Rich Oxide (SRO:H) films were studied. The samples were prepared by Low Pressure Chemical Vapor Deposition (LPCVD) on Si substrates, some samples were thermally annealed at high temperature and hydrogenation was made by low temperature annealing in forming gas. Strong red PL (Photoluminescence) and CL (Cathodoluminescence) in almost all the visible range were obtained. It was found that it is necessary to apply thermal treatment at high temperatures in order to obtain strong Photo and Cathodo-luminescence. Samples with lower silicon excess show maximum luminescence (CL and PL) while samples with higher silicon excess show poor luminescence. The hydrogen promotes the PL emission, but electron beam irradiation (after CL measurements) quenches the red band observed by PL. The results are analyzed to find the dependency of the PL and CL with respect to hydrogenation, silicon excess and thermal treatment. An explanation is presented in order to interpret these experimental results.
Keywords
annealing; cathodoluminescence; electron beam effects; hydrogen; hydrogenation; infrared spectra; phase separation; photoluminescence; silicon compounds; stoichiometry; thin films; Si; SiOx:H; cathodoluminescence; electron beam irradiation; hydrogenated films; hydrogenation; infrared absorption spectra; low pressure chemical vapor deposition; low temperature annealing; phase separation; photoluminescence; stoichiometry; thermal treatment; Annealing; Chemical vapor deposition; Electron beams; Hydrogen; Luminescence; Photoluminescence; Semiconductor films; Silicon; Temperature; Thermal quenching; Cathodoluminescence; Photoluminescence; Silicon Rich Oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrical Engineering, Computing Science and Automatic Control, 2008. CCE 2008. 5th International Conference on
Conference_Location
Mexico City
Print_ISBN
978-1-4244-2498-6
Electronic_ISBN
978-1-4244-2499-3
Type
conf
DOI
10.1109/ICEEE.2008.4723390
Filename
4723390
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