DocumentCode :
1981216
Title :
Focused ion beam post-processing for single mode photonic crystal vertical cavity surface-emitting lasers
Author :
Danner, A.J. ; Yokouchi, N. ; Raftery, J.J., Jr. ; Choquette, K.D.
Author_Institution :
Univ. of Illinois, Urbana, IL, USA
fYear :
2003
fDate :
23-25 June 2003
Firstpage :
155
Lastpage :
156
Abstract :
In this paper, we present the first photonic crystal VCSELs fabricated using FIBE method whereby photonic crystal holes can be etched into prefabricated VCSELs.
Keywords :
focused ion beam technology; photonic crystals; silicon compounds; sputter etching; surface emitting lasers; FIB etching method; SiO/sub 2/; VCSEL; focused ion beam post-processing; photonic crystal vertical cavity surface-emitting lasers; Crystalline materials; Etching; Ion beams; Laser modes; Lattices; Optical materials; Photonic crystals; Silicon compounds; Surface emitting lasers; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2003
Conference_Location :
Salt Lake City, UT, USA
Print_ISBN :
0-7803-7727-3
Type :
conf
DOI :
10.1109/DRC.2003.1226913
Filename :
1226913
Link To Document :
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