Title :
Odd aberration measurement of projection optics in lithographic tools based on dipole illumination
Author :
Peng, Bo ; Wang, Xiangzhao ; Qiu, Zicheng ; Yuan, Qiongyan
Author_Institution :
Inf. Opt. Lab., Chinese Acad. of Sci., Shanghai, China
Abstract :
Theoretical analysis of impact of illumination profile on measurement accuracy is given. A novel measurement technique using Alt-PSM marks under dipole illumination is proposed based on the analysis result.
Keywords :
aberrations; optical projectors; photolithography; Alt-PSM marks; dipole illumination; illumination profile; image displacement; lithographic tools; odd aberration measurement; projection optics; Equations; Frequency; Image analysis; Image sampling; Laboratories; Lighting; Lithography; Measurement techniques; Mechanical variables measurement; Optical diffraction; Alt-PSM marks; dipole illumination; image displacement; odd aberration;
Conference_Titel :
Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics, 2009. CLEO/PACIFIC RIM '09. Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-3829-7
Electronic_ISBN :
978-1-4244-3830-3
DOI :
10.1109/CLEOPR.2009.5292630
