DocumentCode :
1981475
Title :
Reducing the complexity of defect level modeling using the clustering effect
Author :
de Sousa, José T. ; Agrawal, Vishwani D.
Author_Institution :
IST/INESC, Tech. Univ. Lisbon, Portugal
fYear :
2000
fDate :
2000
Firstpage :
640
Lastpage :
644
Abstract :
Accounting for the clustering effect is fundamental to increasing the accuracy of defect level (DL) modeling. This result has long been known in yield modeling but, as far as known, only one DL model directly accounts for it. In this paper we improve this model, reducing its number of parameters from three to two by noticing that multiple faults caused by a single defect can also be modeled as additional clustering. Our result is supported by test data from a real production line
Keywords :
circuit optimisation; computational complexity; integrated circuit modelling; integrated circuit yield; probability; IC yield; clustering effect; defect level modeling; modelling complexity reduction; optimisation procedure; production line data; reject ratio; yield modeling; Bismuth;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design, Automation and Test in Europe Conference and Exhibition 2000. Proceedings
Conference_Location :
Paris
Print_ISBN :
0-7695-0537-6
Type :
conf
DOI :
10.1109/DATE.2000.840853
Filename :
840853
Link To Document :
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