Title :
Numerical study of CW DF chemical laser with helium film injection
Author :
Li, Lan ; Yuan, Shengfu ; Hua, Weihong ; Jiang, Zongfu
Author_Institution :
Coll. of Optoelectric Sci. & Eng., Nat. Univ. of Defense Technol., Changsha, China
Abstract :
Heilium film is introduced to the continuous wave DF/HF chemical laser gain nozzle design. The cavity flowfield´s simulation results show the variation of gas dynamic and gain properties.
Keywords :
chemical lasers; nozzles; numerical analysis; DF chemical laser; cavity flowfield; film injection; gain nozzle design; Chemical engineering; Chemical lasers; Chemical technology; Gas lasers; Hafnium; Helium; Laser theory; Orifices; Protection; Temperature distribution; chemical laser; helium film; numerical simulation;
Conference_Titel :
Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics, 2009. CLEO/PACIFIC RIM '09. Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-3829-7
Electronic_ISBN :
978-1-4244-3830-3
DOI :
10.1109/CLEOPR.2009.5292719
