Title :
Simulation of MOS circuit performance degradation with emphasis on VLSI design-for-reliability
Author :
Leblebici, Y. ; Kang, S.M.
Author_Institution :
Coordinated Sci. Lab., Illinois Univ., Urbana, IL, USA
Abstract :
A framework for a reliability simulation tool to assess the hot-carrier-induced degradation of MOS circuits is presented, and the major components of this framework are examined. A method is introduced for dynamic simulation of hot-carrier-induced transistor degradation within the circuit environment. The approach accounts for the gradual degradation of terminal voltage waveforms of MOS transistors during long-term operation. It is demonstrated that the estimation of individual device lifetimes is not sufficient for circuit reliability assessment. The critical transistors that are most likely to cause circuit performance failures are identified by combining the long-term degradation estimates with the corresponding circuit performance sensitivities
Keywords :
MOS integrated circuits; VLSI; circuit analysis computing; circuit reliability; MOS circuit performance degradation; MOS transistors; VLSI design-for-reliability; circuit performance failures; circuit performance sensitivities; circuit reliability assessment; dynamic simulation; hot-carrier-induced degradation; long-term degradation estimates; reliability simulation tool; terminal voltage waveforms; Circuit optimization; Circuit simulation; Degradation; Hot carriers; Integrated circuit reliability; Life estimation; Lifetime estimation; MOSFETs; Very large scale integration; Voltage;
Conference_Titel :
Computer Design: VLSI in Computers and Processors, 1989. ICCD '89. Proceedings., 1989 IEEE International Conference on
Conference_Location :
Cambridge, MA
Print_ISBN :
0-8186-1971-6
DOI :
10.1109/ICCD.1989.63415