DocumentCode
1984916
Title
Using reflection resonances to improve depth of field for imaging at ultra-high numerical apertures
Author
Mehrotra, P. ; Blaikie, R.J.
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Canterbury, Christchurch, New Zealand
fYear
2011
fDate
Aug. 28 2011-Sept. 1 2011
Firstpage
925
Lastpage
927
Abstract
Imaging at ultra-high numerical apertures imposes severe constraints on the depth of field (DOF). We show how reflection resonances from underlayers can be used to enhance DOF in this regime and present an Equivalent Reflectance Approach (ERA) as a versatile design tool.
Keywords
image processing; light reflection; depth of field; equivalent reflectance approach; reflection resonances; ultra-high numerical apertures; Imaging; Interference; Lithography; Reflection; Reflectivity; Resists;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics Conference & Lasers and Electro-Optics (CLEO/IQEC/PACIFIC RIM), 2011
Conference_Location
Sydney, NSW
Print_ISBN
978-1-4577-1939-4
Type
conf
DOI
10.1109/IQEC-CLEO.2011.6193704
Filename
6193704
Link To Document