• DocumentCode
    1984916
  • Title

    Using reflection resonances to improve depth of field for imaging at ultra-high numerical apertures

  • Author

    Mehrotra, P. ; Blaikie, R.J.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Canterbury, Christchurch, New Zealand
  • fYear
    2011
  • fDate
    Aug. 28 2011-Sept. 1 2011
  • Firstpage
    925
  • Lastpage
    927
  • Abstract
    Imaging at ultra-high numerical apertures imposes severe constraints on the depth of field (DOF). We show how reflection resonances from underlayers can be used to enhance DOF in this regime and present an Equivalent Reflectance Approach (ERA) as a versatile design tool.
  • Keywords
    image processing; light reflection; depth of field; equivalent reflectance approach; reflection resonances; ultra-high numerical apertures; Imaging; Interference; Lithography; Reflection; Reflectivity; Resists;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quantum Electronics Conference & Lasers and Electro-Optics (CLEO/IQEC/PACIFIC RIM), 2011
  • Conference_Location
    Sydney, NSW
  • Print_ISBN
    978-1-4577-1939-4
  • Type

    conf

  • DOI
    10.1109/IQEC-CLEO.2011.6193704
  • Filename
    6193704