Title :
Using reflection resonances to improve depth of field for imaging at ultra-high numerical apertures
Author :
Mehrotra, P. ; Blaikie, R.J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Canterbury, Christchurch, New Zealand
fDate :
Aug. 28 2011-Sept. 1 2011
Abstract :
Imaging at ultra-high numerical apertures imposes severe constraints on the depth of field (DOF). We show how reflection resonances from underlayers can be used to enhance DOF in this regime and present an Equivalent Reflectance Approach (ERA) as a versatile design tool.
Keywords :
image processing; light reflection; depth of field; equivalent reflectance approach; reflection resonances; ultra-high numerical apertures; Imaging; Interference; Lithography; Reflection; Reflectivity; Resists;
Conference_Titel :
Quantum Electronics Conference & Lasers and Electro-Optics (CLEO/IQEC/PACIFIC RIM), 2011
Conference_Location :
Sydney, NSW
Print_ISBN :
978-1-4577-1939-4
DOI :
10.1109/IQEC-CLEO.2011.6193704
