DocumentCode :
1985236
Title :
Fabrication of a dual-wavelength optical pickup head for laser direct writing
Author :
Lee, Yuan-Chin ; Chao, Shiuh ; Huang, Chun-Chieh ; Yang, Chin-Tien
Author_Institution :
Inst. of Photonics Technol., Nat. Tsing Hua Univ., Hsinchu, Taiwan
fYear :
2011
fDate :
Aug. 28 2011-Sept. 1 2011
Firstpage :
1344
Lastpage :
1346
Abstract :
A dual-wavelength optical pickup head is fabricated for laser direct writing. Both 405nm wavelength and 658nm wavelength are used in the pickup head. For exposing organic photo resists, the 405nm wavelength is used as the light source, and the 658nm wavelength is used for the focus servo. While for exposing inorganic photo resists, either wavelength may be used as the light source. It depends on the spot size we need. The numerical aperture (NA) of the objective lens is 0.6. The measured spot size of the objective lens is about 0.35μm at 405nm, and 0.66μm at 658nm. For the preliminary experiments, a spot with about 500nm in diameter and 120nm in depth is achieved for GeTeSnOx inorganic photo resist using the 405nm wavelength. The optimum exposing parameters are still in progress.
Keywords :
laser materials processing; lenses; light sources; optical fabrication; optical storage; photoresists; dual-wavelength optical pickup head; exposing parameters; focus servo; laser direct writing; light source; numerical aperture; objective lens; organic photo resists; spot size; wavelength 405 nm; wavelength 658 nm; Adaptive optics; Lenses; Optical device fabrication; Optical imaging; Optical polarization; Optical pulses; Resists;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quantum Electronics Conference & Lasers and Electro-Optics (CLEO/IQEC/PACIFIC RIM), 2011
Conference_Location :
Sydney, NSW
Print_ISBN :
978-1-4577-1939-4
Type :
conf
DOI :
10.1109/IQEC-CLEO.2011.6193717
Filename :
6193717
Link To Document :
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