• DocumentCode
    1985236
  • Title

    Fabrication of a dual-wavelength optical pickup head for laser direct writing

  • Author

    Lee, Yuan-Chin ; Chao, Shiuh ; Huang, Chun-Chieh ; Yang, Chin-Tien

  • Author_Institution
    Inst. of Photonics Technol., Nat. Tsing Hua Univ., Hsinchu, Taiwan
  • fYear
    2011
  • fDate
    Aug. 28 2011-Sept. 1 2011
  • Firstpage
    1344
  • Lastpage
    1346
  • Abstract
    A dual-wavelength optical pickup head is fabricated for laser direct writing. Both 405nm wavelength and 658nm wavelength are used in the pickup head. For exposing organic photo resists, the 405nm wavelength is used as the light source, and the 658nm wavelength is used for the focus servo. While for exposing inorganic photo resists, either wavelength may be used as the light source. It depends on the spot size we need. The numerical aperture (NA) of the objective lens is 0.6. The measured spot size of the objective lens is about 0.35μm at 405nm, and 0.66μm at 658nm. For the preliminary experiments, a spot with about 500nm in diameter and 120nm in depth is achieved for GeTeSnOx inorganic photo resist using the 405nm wavelength. The optimum exposing parameters are still in progress.
  • Keywords
    laser materials processing; lenses; light sources; optical fabrication; optical storage; photoresists; dual-wavelength optical pickup head; exposing parameters; focus servo; laser direct writing; light source; numerical aperture; objective lens; organic photo resists; spot size; wavelength 405 nm; wavelength 658 nm; Adaptive optics; Lenses; Optical device fabrication; Optical imaging; Optical polarization; Optical pulses; Resists;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quantum Electronics Conference & Lasers and Electro-Optics (CLEO/IQEC/PACIFIC RIM), 2011
  • Conference_Location
    Sydney, NSW
  • Print_ISBN
    978-1-4577-1939-4
  • Type

    conf

  • DOI
    10.1109/IQEC-CLEO.2011.6193717
  • Filename
    6193717