Preparation and optical characterization of ZnO thin film for optoelectronic applications

In the present work, ZnO film has been successfully grown on soda-lime glass substrate using a modified Liquid flow deposition technique (LFD). Structural and optical properties of the samples were characterized using X-Ray Diffraction (XRD), Scanning Electron Microscopy (SEM), Energy Dispersive Analysis using X-Rays (EDAX), Fourier Transform Infrared Spectroscopy (FTIR), UV-Visible and Photoluminescence (PL). Structural analysis using XRD revealed the formation of polycrystalline hexagonal wurtzite structure of ZnO for the film annealed at 300??C. SEM study revealed the smoothness and uniformity of the film with hexagonal nanoparticles of ZnO. FTIR analysis confirms the formation of ZnO in the film. The optical band-gap energy of the obtained film is (3.36 eV) close to that of bulk value. From PL study, blue and red emission peaks were observed for the ZnO film.