Title :
A physics-based statistical model for reliability of STT-MRAM considering oxide variability
Author :
Chih-Hsiang Ho ; Panagopoulos, Georgios D. ; Soo Youn Kim ; Yusung Kim ; Dongsoo Lee ; Roy, Kaushik
Author_Institution :
Purdue Univ., West Lafayette, IN, USA
Abstract :
A physics-based statistical model considering oxide thickness (Tox) variability is proposed for evaluating the impact of time-dependent dielectric breakdown (TDDB) on the performance of spin-transfer torque magneto-resistive random access memory (STT-MRAM). The statistics of breakdown events are captured by the percolation theory, physics-based analytical model for successive break down (BD) and 1-D non-equilibrium Green´s function (NEGF). Using the proposed model, we examine Tox-dependence of STT-MRAM performance distribution, such as tunneling magneto-resistance ratio (TMR) and critical current (IC). Simulation results clearly show that oxide variability needs to be taken into account for better lifetime prediction. The proposed model has been validated with experimental data.
Keywords :
Green´s function methods; MRAM devices; integrated circuit modelling; integrated circuit reliability; statistical analysis; 1D nonequilibrium Green´s function; STT-MRAM reliability; breakdown events; critical current; lifetime prediction; oxide thickness variability; oxide variability; percolation theory; performance distribution; physics-based analytical model; physics-based statistical model; spin-transfer torque magneto-resistive random access memory; successive break down; time-dependent dielectric breakdown; tunneling magneto-resistance ratio; Degradation; Electric breakdown; Integrated circuit modeling; Magnetic tunneling; Reliability; Resistance; Stress;
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2013 International Conference on
Conference_Location :
Glasgow
Print_ISBN :
978-1-4673-5733-3
DOI :
10.1109/SISPAD.2013.6650566