DocumentCode :
1987529
Title :
Performance Trends of Si-Based RF Transistors
Author :
Schwierz, F. ; Schippel, C.
Author_Institution :
Department of Solid-State Electronics, Technische Universitaet Ilmenau, Germany, E-mail: frank.schwierz@tu-ilmenau.de
fYear :
2005
fDate :
19-21 Dec. 2005
Firstpage :
299
Lastpage :
304
Abstract :
This paper discusses several aspects of the performance of advanced Si-based RF transistors. The RF performance of SiGe HBTs and Si RF MOSFETs is reviewed and compared to that of III-V RF transistors. The speed - breakdown voltage tradeoff which is typical for bipolar transistors is discussed with special emphasis on SiGe HBTs. On the field-effect transistor side, we review the performance of state-of-the-art Si RF MOSFETs and show that these devices are highly competitive in terms of speed and cutoff frequency.
Keywords :
Cutoff frequency; FETs; Gallium arsenide; Germanium silicon alloys; III-V semiconductor materials; Indium phosphide; MOSFETs; Radio frequency; Silicon germanium; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits, 2005 IEEE Conference on
Print_ISBN :
0-7803-9339-2
Type :
conf
DOI :
10.1109/EDSSC.2005.1635267
Filename :
1635267
Link To Document :
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