• DocumentCode
    1987529
  • Title

    Performance Trends of Si-Based RF Transistors

  • Author

    Schwierz, F. ; Schippel, C.

  • Author_Institution
    Department of Solid-State Electronics, Technische Universitaet Ilmenau, Germany, E-mail: frank.schwierz@tu-ilmenau.de
  • fYear
    2005
  • fDate
    19-21 Dec. 2005
  • Firstpage
    299
  • Lastpage
    304
  • Abstract
    This paper discusses several aspects of the performance of advanced Si-based RF transistors. The RF performance of SiGe HBTs and Si RF MOSFETs is reviewed and compared to that of III-V RF transistors. The speed - breakdown voltage tradeoff which is typical for bipolar transistors is discussed with special emphasis on SiGe HBTs. On the field-effect transistor side, we review the performance of state-of-the-art Si RF MOSFETs and show that these devices are highly competitive in terms of speed and cutoff frequency.
  • Keywords
    Cutoff frequency; FETs; Gallium arsenide; Germanium silicon alloys; III-V semiconductor materials; Indium phosphide; MOSFETs; Radio frequency; Silicon germanium; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Solid-State Circuits, 2005 IEEE Conference on
  • Print_ISBN
    0-7803-9339-2
  • Type

    conf

  • DOI
    10.1109/EDSSC.2005.1635267
  • Filename
    1635267