DocumentCode :
1987828
Title :
Impact of band non-parabolicity on the onset voltage in a nanowire tunnel field-effect transistor
Author :
Carrillo-Nunez, Hamilton ; Magnus, W. ; Vandenberghe, W.G. ; Soree, Bart ; Peeters, F.M.
Author_Institution :
Technopole de Chateau-Gombert, IM2NP, Marseille, France
fYear :
2013
fDate :
3-5 Sept. 2013
Firstpage :
93
Lastpage :
96
Abstract :
The phonon-assisted band-to-band tunneling (BTBT) current has been computed for a cylindrical nanowire tunneling field-effect transistor (TFET) with an all-round gate covering the source region. Although we have considered relatively thick wires, i.e. diameters ranging between 5 and 8 nm, we found that BTBT is considerably affected by the carrier confinement in the radial direction. Therefore, a self-consistent solution of the Schrödinger and Poisson equations must be carried out. For the latter, we have implemented a non-linear variational principle based on the modified local density approximation taking into account non-parabolic corrections for both conduction and valence bands. Our findings show not only that the confinement effects in nanowire TFETs have a stronger impact on the onset voltage of the tunneling current in comparison with their planar counterparts but also that the value of the onset voltage is overestimated when the valence band nonparabolicity is ignored.
Keywords :
Poisson equation; Schrodinger equation; conduction bands; field effect transistors; nanowires; valence bands; Poisson equation; Schrodinger equation; TFET; all-round gate; band nonparabolicity; carrier confinement; conduction band; confinement effects; cylindrical nanowire tunneling field-effect transistor; modified local density approximation; nonlinear variational principle; nonparabolic corrections; onset voltage; phonon-assisted band-to-band tunneling current; radial direction; size 5 nm to 8 nm; source region; valence band; Approximation methods; Electric potential; Logic gates; Poisson equations; Transistors; Tunneling; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2013 International Conference on
Conference_Location :
Glasgow
ISSN :
1946-1569
Print_ISBN :
978-1-4673-5733-3
Type :
conf
DOI :
10.1109/SISPAD.2013.6650582
Filename :
6650582
Link To Document :
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