• DocumentCode
    1987916
  • Title

    A Compact Model for Reliability Simulation of Deep-Submicron MOS Devices and Circuits

  • Author

    Cui, Zhi ; Liou, Juin J.

  • Author_Institution
    Department of Electrical and Computer Engineering, University of Central, Florida, Orlando, Florida, 32816 USA, Fax: 407-823-5835
  • fYear
    2005
  • fDate
    19-21 Dec. 2005
  • Firstpage
    391
  • Lastpage
    396
  • Abstract
    Continuing down scaling in CMOS technology has resulted in an increasing and urgent need for a Spice-like reliability model that is capable of predicting the long-term degradation of MOS devices and ICs. In this paper, we develop such a model based on the industry standard BSIM3 model and empirical degradation expressions for the threshold voltage and mobility of MOSFETs. The model is implemented in Cadence Spectre via Verilog-A, and measured data obtained from devices fabricated from the 0.18-μm CMOS technology have been included in support of the model development.
  • Keywords
    CMOS technology; Circuit simulation; Degradation; Hardware design languages; MOS devices; MOSFETs; Predictive models; Semiconductor device modeling; Standards development; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Solid-State Circuits, 2005 IEEE Conference on
  • Print_ISBN
    0-7803-9339-2
  • Type

    conf

  • DOI
    10.1109/EDSSC.2005.1635289
  • Filename
    1635289