DocumentCode :
1987981
Title :
Effects of phonon scattering on discrete-impurity-induced current fluctuation in silicon nanowire transistors
Author :
Mori, Nobuya ; Uematsu, M. ; Mil´nikov, Gennady ; Minari, H. ; Itoh, Kohei M.
Author_Institution :
CREST, Japan Sci. & Technol. Agency (JST), Tokyo, Japan
fYear :
2013
fDate :
3-5 Sept. 2013
Firstpage :
119
Lastpage :
122
Abstract :
Effects of phonon scattering on random-dopant-induced current fluctuations are investigated in silicon nanowire transistors. Active dopant distributions obtained through kinetic Monte Carlo simulation are introduced into 10nm-gate-length n-type nanowire transistors, and the current-voltage characteristics are calculated by the non-equilibrium Green´s function method. The current fluctuation is found to be suppressed by ~ 40% by phonon scatterings at the on-state, while it is very weakly affected at the off-state.
Keywords :
Green´s function methods; MOSFET; Monte Carlo methods; elemental semiconductors; nanowires; silicon; Si; active dopant distributions; current-voltage characteristics; discrete-impurity-induced current fluctuation; gate-length n-type nanowire transistors; kinetic Monte Carlo simulation; nonequilibrium Green´s function method; phonon scattering; random-dopant-induced current fluctuations; silicon nanowire transistors; size 10 nm; Logic gates; MOSFET; Phonons; Scattering; Semiconductor process modeling; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2013 International Conference on
Conference_Location :
Glasgow
ISSN :
1946-1569
Print_ISBN :
978-1-4673-5733-3
Type :
conf
DOI :
10.1109/SISPAD.2013.6650589
Filename :
6650589
Link To Document :
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