DocumentCode
1987996
Title
Internal stress in sputtered gold electrodes and its significance for quartz resonators
Author
Thornell, Greger ; Ericson, Fredric ; Portnoff, Guy
Author_Institution
Angstrom Lab., Uppsala Univ., Sweden
Volume
2
fYear
1999
fDate
1999
Firstpage
800
Abstract
Internal stress in magnetron sputtered gold films, as estimated with the cantilever beam deflection method, is correlated to deposition parameters such as pressure, temperature and deposition rate, as well as morphology and the amount of gas entrapped in the film. The compressive stress was found to increase with higher deposition rate, lower temperature or lower pressure which is in accordance with the elsewhere proposed atomic peening model
Keywords
crystal resonators; electrodes; gold; internal stresses; quartz; sputtered coatings; Au; SiO2; atomic peening model; cantilever beam deflection; gold electrode; internal stress; magnetron sputtered film; quartz resonator; Compressive stress; Electrodes; Gold; Internal stresses; Residual stresses; Structural beams; Substrates; Temperature; Thermal stresses; X-ray diffraction;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency and Time Forum, 1999 and the IEEE International Frequency Control Symposium, 1999., Proceedings of the 1999 Joint Meeting of the European
Conference_Location
Besancon
ISSN
1075-6787
Print_ISBN
0-7803-5400-1
Type
conf
DOI
10.1109/FREQ.1999.841426
Filename
841426
Link To Document