DocumentCode :
1988742
Title :
Compact physical models for gate charge and gate capacitances of AlGaN/GaN HEMTs
Author :
Yigletu, F.M. ; Iniguez, B. ; Khandelwal, Sourabh ; Fjeldly, T.A.
Author_Institution :
Dept. of Electr. Electron. & Autom. Eng., Univ. Rovira i Virgili, Tarragona, Spain
fYear :
2013
fDate :
3-5 Sept. 2013
Firstpage :
268
Lastpage :
271
Abstract :
This work presents a physical analytical model for the total gate charge and C-V characteristics of AlGaN/GaN HEMT devices. A continuous analytical model of the gate-charge is developed first, based on an assumption of considering only the first energy level in the triangular quantum well approximation at the AlGaN/GaN interface where most of charge carriers reside. The gate-source and the gate-drain capacitances are then obtained through differentiation of the gate charge at the corresponding terminal voltages. Excellent agreements between the modeled and measured C-V characteristics of a device were obtained.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; wide band gap semiconductors; AlGaN-GaN; C-V characteristics; HEMT; compact physical models; gate capacitances; gate charge; terminal voltages; Aluminum gallium nitride; Analytical models; Capacitance; Gallium nitride; HEMTs; Logic gates; MODFETs; HEMTs; Power Amplifiers; Semiconductor Device Modeling; Simulation; power transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2013 International Conference on
Conference_Location :
Glasgow
ISSN :
1946-1569
Print_ISBN :
978-1-4673-5733-3
Type :
conf
DOI :
10.1109/SISPAD.2013.6650626
Filename :
6650626
Link To Document :
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