DocumentCode :
1988860
Title :
Simulation on endurance characteristic of charge trapping memory
Author :
Zhiyuan Lun ; Taihuan Wang ; Lang Zeng ; Kai Zhao ; Xiaoyan Liu ; Yi Wang ; Jinfeng Kang ; Gang Du
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
fYear :
2013
fDate :
3-5 Sept. 2013
Firstpage :
292
Lastpage :
295
Abstract :
A comprehensive simulation method for endurance reliability issues in charge trapping memory is developed. For this purpose, a practical algorithm is carefully designed to investigate the cycling performance of charge trapping memory. The models that account for the generation of substrate/tunneling oxide interface trapped charge and oxide trapped charge are incorporated into the simulation. The influence of these models on flat-band voltage evolution under programing/erasing cycling is investigated in detail, thus providing insight into the mechanism of the endurance issues in charge trapping memory.
Keywords :
circuit simulation; integrated circuit reliability; semiconductor storage; tunnelling; charge trapping memory; cycling performance; endurance characteristic; endurance reliability issues; flat-band voltage evolution; oxide trapped charge; programing/erasing cycling; substrate/tunneling oxide interface; Electron traps; Hafnium compounds; Reliability; Semiconductor process modeling; Silicon; Tunneling; charge trapping memory; cycling; endurance; interface trapped charge; oxide trapped charge;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2013 International Conference on
Conference_Location :
Glasgow
ISSN :
1946-1569
Print_ISBN :
978-1-4673-5733-3
Type :
conf
DOI :
10.1109/SISPAD.2013.6650632
Filename :
6650632
Link To Document :
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