DocumentCode :
1989418
Title :
First-principle investigation of Ti wetting layer influence on metal-graphene contact
Author :
Xiang Ji ; Yan Wang ; Zhiping Yu
Author_Institution :
Inst. of Microelectron., Tsinghua Univ., Beijing, China
fYear :
2013
fDate :
3-5 Sept. 2013
Firstpage :
392
Lastpage :
395
Abstract :
Metal (M) /grapheme (Gr) contact has attracted much attention since the contact resistance (Rc) between Gr and metal electrode is crucially important for achieving high performance of grapheme-based devices [[1]-[15]]. Published experimental works on metal/graphene contacts generally adopted Gr/Ti/Metal structure to enhance the interfacial adhesion [[1]-[8]]. However, how the presence of Ti wetting layer can influence the global response of Gr-based device remains unclear. To present a clear physical understanding and optimizing transport between metal electrodes and graphene with Ti wetting layer, the binding energy, band structure, interface potential profile and contact resistance of the Gr/Ti/Metal (Al, Cu, Au, Pt, Pd) systems were studied for the first time by first-principle and NEGF methods in this paper. The results provide insights into contact resistance optimization and the ultimate scalability of graphene-based devices.
Keywords :
binding energy; contact resistance; electrodes; graphene; titanium compounds; Ti; band structure; binding energy; contact resistance; first-principle investigation; interface potential profile; interfacial adhesion; metal electrode; metal-graphene contact; wetting layer influence; Chemicals; Contact resistance; Electric potential; Gold; Graphene; Lattices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2013 International Conference on
Conference_Location :
Glasgow
ISSN :
1946-1569
Print_ISBN :
978-1-4673-5733-3
Type :
conf
DOI :
10.1109/SISPAD.2013.6650657
Filename :
6650657
Link To Document :
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