Title :
New photoresists for super-resolution photo-inhibition nanofabrication
Author :
Cao, Yaoyu ; Gan, Zongsong ; Jia, Baohua ; Evans, Richard A. ; Gu, Min
Author_Institution :
Centre for Micro-Photonics & Centre for Ultrahigh-bandwidth Devices for Opt. Syst. (CUDOS), Swinburne Univ. of Technol., Hawthorn, VIC, Australia
fDate :
Aug. 28 2011-Sept. 1 2011
Abstract :
Direct laser writing based on photoinhibited polymerization has met great challenges to produce three-dimensional structures of nano-scale feature size due to the properties of photoresist. We developed a photoresist of high photosensitivity to improve the fabrication resolution and introduced a two-photon photoinitiator into the photoresist to implement photoinhibited polymerization in two-photon fabrication. Consequently, we realised dots of 40 nm in diameter and lines of 130 nm in width through single-photon polymerization and achieved effective photoinhibited polymerisation in the two-photon process.
Keywords :
laser materials processing; nanolithography; photoresists; polymerisation; two-photon processes; direct laser writing; nanoscale feature size; photoinhibited polymerization; photoresists; photosensitivity; single-photon polymerization; size 40 nm; superresolution photoinhibition nanofabrication; two-photon photoinitiator; Fabrication; Laser beams; Laser modes; Polymers; Power lasers; Resists; Shape;
Conference_Titel :
Quantum Electronics Conference & Lasers and Electro-Optics (CLEO/IQEC/PACIFIC RIM), 2011
Conference_Location :
Sydney, NSW
Print_ISBN :
978-1-4577-1939-4
DOI :
10.1109/IQEC-CLEO.2011.6194019
