• DocumentCode
    1992407
  • Title

    PZT transduced high-overtone width-extensional resonators above 1 GHz

  • Author

    Chandrahalim, Hengky ; Bhave, Sunil A. ; Polcawich, Ronald G. ; Pulskamp, Jeffrey S. ; Kaul, Roger

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Cornell Univ., Ithaca, NY, USA
  • fYear
    2009
  • fDate
    20-23 Sept. 2009
  • Firstpage
    2145
  • Lastpage
    2148
  • Abstract
    This paper provides the theoretical modeling, simulation, and quantitative comparison that explore the design space of PZT-only (Lead Zirconate Titanate) and PZT-on 3, 5 and 10 ¿m single-crystal silicon high-overtone width-extensional mode (WEM) resonators with identical lateral dimensions for incorporation into radio frequency microelectromechanical systems (RF MEMS) filters and oscillators. A novel fabrication technique was developed to fabricate the resonators with and without silicon layer using the same mask-set on the same wafer. The air-bridge metal routings were implemented to carry electrical signals while avoiding large capacitances from the bond-pads. We theoretically verified and experimentally measured the correlation of motional impedance (RX), quality factor (Q), and resonance frequency (f) with the resonators´ silicon layer thickness (tSi) up to above 1 GHz frequency of operation. For identical lateral dimensions and PZT-layer thickness (tPZT), the resonators with thicker silicon layer have higher f. The resonators with thicker silicon also have higher Q and lower RX up to 900 MHz frequency.
  • Keywords
    lead compounds; micromechanical resonators; piezoceramics; piezoelectric transducers; radiofrequency oscillators; silicon; titanium compounds; ultrasonic transducers; zirconium compounds; PZT layer thickness; PZT transduced resonators; Pb(ZrxTi1-x)O3-Si; WEM resonators; high overtone resonators; lead zirconate titanate transducer; microelectromechanical systems; motional impedance; quality factor; radiofrequency MEMS filters; radiofrequency MEMS oscillators; resonance frequency; resonator fabrication; resonator silicon layer thickness; single crystal silicon layer; width extensional mode resonators; Capacitance; Fabrication; Frequency; Oscillators; Radiofrequency microelectromechanical systems; Resonator filters; Routing; Silicon; Space exploration; Titanium compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium (IUS), 2009 IEEE International
  • Conference_Location
    Rome
  • ISSN
    1948-5719
  • Print_ISBN
    978-1-4244-4389-5
  • Electronic_ISBN
    1948-5719
  • Type

    conf

  • DOI
    10.1109/ULTSYM.2009.5441468
  • Filename
    5441468