DocumentCode :
1992407
Title :
PZT transduced high-overtone width-extensional resonators above 1 GHz
Author :
Chandrahalim, Hengky ; Bhave, Sunil A. ; Polcawich, Ronald G. ; Pulskamp, Jeffrey S. ; Kaul, Roger
Author_Institution :
Sch. of Electr. & Comput. Eng., Cornell Univ., Ithaca, NY, USA
fYear :
2009
fDate :
20-23 Sept. 2009
Firstpage :
2145
Lastpage :
2148
Abstract :
This paper provides the theoretical modeling, simulation, and quantitative comparison that explore the design space of PZT-only (Lead Zirconate Titanate) and PZT-on 3, 5 and 10 ¿m single-crystal silicon high-overtone width-extensional mode (WEM) resonators with identical lateral dimensions for incorporation into radio frequency microelectromechanical systems (RF MEMS) filters and oscillators. A novel fabrication technique was developed to fabricate the resonators with and without silicon layer using the same mask-set on the same wafer. The air-bridge metal routings were implemented to carry electrical signals while avoiding large capacitances from the bond-pads. We theoretically verified and experimentally measured the correlation of motional impedance (RX), quality factor (Q), and resonance frequency (f) with the resonators´ silicon layer thickness (tSi) up to above 1 GHz frequency of operation. For identical lateral dimensions and PZT-layer thickness (tPZT), the resonators with thicker silicon layer have higher f. The resonators with thicker silicon also have higher Q and lower RX up to 900 MHz frequency.
Keywords :
lead compounds; micromechanical resonators; piezoceramics; piezoelectric transducers; radiofrequency oscillators; silicon; titanium compounds; ultrasonic transducers; zirconium compounds; PZT layer thickness; PZT transduced resonators; Pb(ZrxTi1-x)O3-Si; WEM resonators; high overtone resonators; lead zirconate titanate transducer; microelectromechanical systems; motional impedance; quality factor; radiofrequency MEMS filters; radiofrequency MEMS oscillators; resonance frequency; resonator fabrication; resonator silicon layer thickness; single crystal silicon layer; width extensional mode resonators; Capacitance; Fabrication; Frequency; Oscillators; Radiofrequency microelectromechanical systems; Resonator filters; Routing; Silicon; Space exploration; Titanium compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium (IUS), 2009 IEEE International
Conference_Location :
Rome
ISSN :
1948-5719
Print_ISBN :
978-1-4244-4389-5
Electronic_ISBN :
1948-5719
Type :
conf
DOI :
10.1109/ULTSYM.2009.5441468
Filename :
5441468
Link To Document :
بازگشت