Title :
Total ionizing dose tolerance of the resistance switching of Ag-Ge4oSeo based Programmable Metallization Cells
Author :
Dandamudi, P. ; Barnaby, H.J. ; Kozicki, M.N. ; Gonzalez-Velo, Y. ; Holbert, K.E.
Author_Institution :
Sch. of Electr., Comput. & Energy Eng., Arizona State Univ., Tempe, AZ, USA
Abstract :
Programmable Metallization Cells (PMC) are two-terminal elements that exhibit resistance switching which is based on the combination of bias dependent ion conduction through a solid-state electrolyte and reduction/oxidation (redox) reactions occurring at the electrode terminals. PMC based resistive random access memory (ReRAM) is currently used in emerging nonvolatile memory technologies and has the potential to be the successor of current flash memory technology. In this study we demonstrate the radiation tolerance of Ag-doped Ge40S60 based PMC elements that were irradiated up to a total ionizing dose (TID) of 10 Mrad(Ge40S60) using 60Co gamma rays. The irradiated devices show no significant degradation in the resistance switching.
Keywords :
MIM structures; flash memories; germanium compounds; oxidation; radiation effects; random-access storage; silver compounds; Ag-Ge40S60; PMC based resistive random access memory; ReRAM; electrode terminals; flash memory technology; ion conduction; irradiated devices; nonvolatile memory technologies; programmable metallization cells; redox reactions; reduction/oxidation reactions; resistance switching; solid-state electrolyte; total ionizing dose tolerance; two-terminal elements; Anodes; Cathodes; Metallization; Resistance; Silver; Switches; ReRAM; chalcogenide glass; programmable metallization cells; radiation hardening; total ionizing dose;
Conference_Titel :
Radiation and Its Effects on Components and Systems (RADECS), 2013 14th European Conference on
Conference_Location :
Oxford
DOI :
10.1109/RADECS.2013.6937426