• DocumentCode
    1995587
  • Title

    Tapered-VTH CMOS buffer design for improved energy efficiency in deep nanometer technology

  • Author

    Frustaci, Fabio ; Corsonello, Pasquale ; Alioto, Massimo

  • Author_Institution
    Dept. of Electron., Comput. Sci. & Syst., Univ. of Calabria, Rende, Italy
  • fYear
    2011
  • fDate
    15-18 May 2011
  • Firstpage
    2075
  • Lastpage
    2078
  • Abstract
    In this paper, the novel "tapered-Vth" approach to design energy-efficient CMOS buffers is introduced. In this approach, the substantial energy consumption due to leakage is reduced by tapering the threshold voltage throughout the buffer stages, other than tapering the transistor size. More specifically, the threshold voltage is progressively reduced when going from the last to the first stage. This enables a considerable leakage reduction in the last stages (which contribute most to the overall leakage) at the price of a higher delay. The resulting delay penalty is then compensated by reducing the transistor threshold voltage in the first stages, with an insignificant leakage increase (they contribute very little to the overall buffer leakage). Simulation results based on a commercial 45-nm 1-V CMOS technology show that the proposed "tapered-VTH" approach can considerably improve the energy efficiency of CMOS buffers over the entire spectrum of possible energy-delay tradeoffs, from high speed to low power.
  • Keywords
    CMOS integrated circuits; buffer circuits; energy conservation; integrated circuit design; leakage currents; low-power electronics; nanoelectronics; deep nanometer technology; energy consumption; energy efficiency; energy-delay tradeoffs; leakage reduction; size 45 nm; tapered-Vth CMOS buffer design; transistor threshold voltage; voltage 1 V; CMOS integrated circuits; Capacitance; Delay; Energy efficiency; Inverters; Optimization; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Circuits and Systems (ISCAS), 2011 IEEE International Symposium on
  • Conference_Location
    Rio de Janeiro
  • ISSN
    0271-4302
  • Print_ISBN
    978-1-4244-9473-6
  • Electronic_ISBN
    0271-4302
  • Type

    conf

  • DOI
    10.1109/ISCAS.2011.5938006
  • Filename
    5938006