DocumentCode :
1995589
Title :
Reflectance As A Thickness And Growth Rate Monitor For Chemical Vapor Deposition
Author :
Breiland, W.G. ; Killeen, K.P. ; Omstead, T.R.
Author_Institution :
Sandia National Laboratories
fYear :
1992
fDate :
16-19 Nov 1992
Firstpage :
11
Lastpage :
12
Keywords :
Chemical vapor deposition; Inductors; Microelectronics; Monitoring; Optical films; Performance evaluation; Reflectivity; Thickness measurement; Transistors; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
LEOS '92, Conference Proceedings. IEEE Lasers and Electro-Optics Society, 1992 Annual Meeting
Print_ISBN :
0-7803-0526-4
Type :
conf
DOI :
10.1109/LEOS.1992.693819
Filename :
693819
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1995589
بازگشت