Title : 
Crystal-orientation controlled PZT FeRAM-capacitors using RF magnetron sputtering with 12"/spl phi/ single target
         
        
            Author : 
Inoue, N. ; Maejima, Y. ; Hayashi, Y.
         
        
            Author_Institution : 
ULSI Res. Lab., NEC Corp., Sagamihara, Japan
         
        
        
        
        
        
            Abstract : 
Crystal-orientation control of PZT is very important to obtain a ferroelectric capacitor with large remnant polarization. Perovskite PZT with {100}-orientation, parallel to the polarization axis, is obtained by RF-sputtering and 600/spl deg/C annealing. A metastable pyrochlore film, sputtered around 500/spl deg/C, is transformed to the crystal-orientated perovskite PZT film (stable phase). The PZT capacitor has large remnant polarization of 2P/sub r/=28 /spl mu/C/cm/sup 2/. The small capacitor, sized from 2 /spl mu/m/spl square/ to 100 /spl mu/m/spl square/, retains superior characteristics after Al metallization, being applicable to a high density FeRAM memory cell.
         
        
            Keywords : 
dielectric polarisation; ferroelectric capacitors; ferroelectric storage; ferroelectric thin films; lead compounds; piezoceramics; random-access storage; sputter deposition; sputtered coatings; 12 in; 500 C; 600 C; Al; Al metallization; PZT; PbZrO3TiO3; RF magnetron sputtering; annealing; crystal-orientated perovskite PZT film; ferroelectric RAM; ferroelectric capacitors; high density memory cell; metastable pyrochlore film; remnant polarization; Annealing; Capacitors; Ferroelectric films; Ferroelectric materials; Metallization; Metastasis; Nonvolatile memory; Polarization; Radio frequency; Random access memory;
         
        
        
        
            Conference_Titel : 
Electron Devices Meeting, 1997. IEDM '97. Technical Digest., International
         
        
            Conference_Location : 
Washington, DC, USA
         
        
        
            Print_ISBN : 
0-7803-4100-7
         
        
        
            DOI : 
10.1109/IEDM.1997.650457