• DocumentCode
    2003218
  • Title

    Revisiting of RAC devices

  • Author

    Li, Xianyi ; Plessky, Victor ; Hartogh, Paul ; Weimann, Thomas ; Reindl, Leonhard ; Grigorievsky, V.I.

  • Author_Institution
    Max Planck Inst. for Solar Syst. Res., Katlenburg Lindau, Germany
  • fYear
    2009
  • fDate
    20-23 Sept. 2009
  • Firstpage
    2663
  • Lastpage
    2667
  • Abstract
    The development of RAC devices usually is focused on 2 goals, to minimize the insertion loss and phase deviation of S21(f) from ideal quadratic dependence. For large bandwidth RAC filter, to have the balance between the 2 goals, amplitude weighting technique is needed. One hand it can reduce too high reflectivity at certain frequency so as to control the multiple reflections which will cause phase diviation; and on another hand it can realise a flat passband so to have good compressed pulse shape. To avoid the profile depth etching, we concentrated on methods of weighting on reflecting structures. Comparing different type of reflectors and different methods of weighting their reflectivity, we found that the best results can be obtained using grooves of uniform depth along the structure and weighting by variation of the duty cycle of grooves. For typical down chirp device with B=400 MHz, T=20 us this approach results in the variation of the groove width duty cycle from about 10% to fully 50%.Then the narrowest width is about 220 nm, i.e. very close to the critical dimension of photo lithography(100 nm). Therefore we have used the standard e-beam lithography equipment for precise exposure of the weighted groove array. With this method, BT=8000 RAC filters with total insertion loss 55 dB and RMS phase deviation 15 degrees was developed.
  • Keywords
    acoustic wave reflection; electron beam lithography; surface acoustic wave filters; RAC devices; compressed pulse shape; down chirp device; duty cycle; groove width; ideal quadratic dependence; insertion loss; large bandwidth RAC filter; phase deviation; photolithography; profile depth etching; reflectivity reduction; weighting technique; Band pass filters; Bandwidth; Frequency; Insertion loss; Passband; Pulse compression methods; Pulse shaping methods; Reflection; Reflectivity; Shape control; Duty Cycle Weighting; RAC; e-beam lithography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium (IUS), 2009 IEEE International
  • Conference_Location
    Rome
  • ISSN
    1948-5719
  • Print_ISBN
    978-1-4244-4389-5
  • Electronic_ISBN
    1948-5719
  • Type

    conf

  • DOI
    10.1109/ULTSYM.2009.5441936
  • Filename
    5441936