DocumentCode
2003218
Title
Revisiting of RAC devices
Author
Li, Xianyi ; Plessky, Victor ; Hartogh, Paul ; Weimann, Thomas ; Reindl, Leonhard ; Grigorievsky, V.I.
Author_Institution
Max Planck Inst. for Solar Syst. Res., Katlenburg Lindau, Germany
fYear
2009
fDate
20-23 Sept. 2009
Firstpage
2663
Lastpage
2667
Abstract
The development of RAC devices usually is focused on 2 goals, to minimize the insertion loss and phase deviation of S21(f) from ideal quadratic dependence. For large bandwidth RAC filter, to have the balance between the 2 goals, amplitude weighting technique is needed. One hand it can reduce too high reflectivity at certain frequency so as to control the multiple reflections which will cause phase diviation; and on another hand it can realise a flat passband so to have good compressed pulse shape. To avoid the profile depth etching, we concentrated on methods of weighting on reflecting structures. Comparing different type of reflectors and different methods of weighting their reflectivity, we found that the best results can be obtained using grooves of uniform depth along the structure and weighting by variation of the duty cycle of grooves. For typical down chirp device with B=400 MHz, T=20 us this approach results in the variation of the groove width duty cycle from about 10% to fully 50%.Then the narrowest width is about 220 nm, i.e. very close to the critical dimension of photo lithography(100 nm). Therefore we have used the standard e-beam lithography equipment for precise exposure of the weighted groove array. With this method, BT=8000 RAC filters with total insertion loss 55 dB and RMS phase deviation 15 degrees was developed.
Keywords
acoustic wave reflection; electron beam lithography; surface acoustic wave filters; RAC devices; compressed pulse shape; down chirp device; duty cycle; groove width; ideal quadratic dependence; insertion loss; large bandwidth RAC filter; phase deviation; photolithography; profile depth etching; reflectivity reduction; weighting technique; Band pass filters; Bandwidth; Frequency; Insertion loss; Passband; Pulse compression methods; Pulse shaping methods; Reflection; Reflectivity; Shape control; Duty Cycle Weighting; RAC; e-beam lithography;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics Symposium (IUS), 2009 IEEE International
Conference_Location
Rome
ISSN
1948-5719
Print_ISBN
978-1-4244-4389-5
Electronic_ISBN
1948-5719
Type
conf
DOI
10.1109/ULTSYM.2009.5441936
Filename
5441936
Link To Document