DocumentCode
2004483
Title
A Fully Automated On-Wafer Pulsed Measurement System, with Variable Pulse-Length and Duty Cycle, for Accurate Large Signal FET Modeling
Author
Vidalou, J.F. ; Grossier, F. ; Camiade, M. ; Obregon, J.
Author_Institution
IRCOM-CNRS Université de Limoges - 123, Avenue A.-Thomas, 87060 LIMOGES CEDEX FRANCE
fYear
1989
fDate
4-7 Sept. 1989
Firstpage
569
Lastpage
575
Abstract
We present in this paper an on wafer fully-automated pulsed-measurement system allowing to extract automatically the characteristics of the non-linear current generators of a FET in function of the gate to source (Vgs) and drain to source (Vds) voltages. The measurement-system is coupled to a data-processing sofware which includes a fitting algorithm. Measurements may be performed for different pulsawidths and duty-cycles, in view of modelling the trapping effects. Finally by performing the measurements at different temperatures, this parameter may be taken into account in the non-linear FET model. Note that the automated on-wafer measurements will allow to perform statistical analysis and then will facilitate the determination of an averaged FET non-linear equivalent-circuit for every wafer processed.
Keywords
Character generation; Current measurement; Distortion measurement; Microwave FETs; Performance evaluation; Predictive models; Pulse generation; Pulse measurements; Semiconductor device modeling; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference, 1989. 19th European
Conference_Location
London, UK
Type
conf
DOI
10.1109/EUMA.1989.334029
Filename
4132741
Link To Document