Title :
Beam current instability analysis with FFT
Author :
Katsap, Victor ; Kendall, Rodney A. ; Saito, Kenichi
Author_Institution :
NuFlare Technol., Hopewell Junction, NY
Abstract :
In shaped-beam mask writing tools, beam current is fairly small, often under 1 muA, with required stability of Lt1%. Beam is originated at the cathode, and passes thru multitude of electron-optical components before reaching target plane. Hence, beam current stability is affected by multiple factors, like power supplies, spurious electromagnetic fields, temperature, pressure, and the emitterpsilas own instability. We report results of analysis which allows us to uncover and separate environment-related beam current instabilities from emitter-related ones.
Keywords :
cathodes; electron beam lithography; electron guns; fast Fourier transforms; FFT; beam current instability analysis; cathode; electron-optical components; emitter-related instabilities; environment-related instabilities; fast Fourier transform; power supplies; shaped-beam mask writing; spurious electromagnetic fields; Beams; Cathodes; Electronic mail; Fluctuations; Power harmonic filters; Power supplies; Speech analysis; Stability analysis; Temperature; Writing;
Conference_Titel :
Vacuum Electronics Conference, 2008. IVEC 2008. IEEE International
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4244-1715-5
DOI :
10.1109/IVELEC.2008.4556369