• DocumentCode
    2005196
  • Title

    Advanced electron guns and depressed collectors design and optimization using the MICHELLE / ANALYST Environment

  • Author

    Held, Ben ; DeFord, John ; Petillo, John ; Panagos, Dimitrios ; Nelson, Eric ; Levush, Baruch

  • Author_Institution
    STAAR Inc., Mequon, WI
  • fYear
    2008
  • fDate
    22-24 April 2008
  • Firstpage
    457
  • Lastpage
    458
  • Abstract
    Next generation vacuum electron devices under development for millimeter and sub-millimeter wavelengths are often characterized by very small features that must be very precisely designed and manufactured for proper tube function and longevity. In this regime the need for automated physics-based optimization to aid the designer in meeting device performance specifications is much more critical than in larger, lower frequency devices where prototyping and experimentation are more readily performed. Recent work has been done on improving the ability of modeling and design simulation environments to aid the designer in finding optimum configurations. As the simulation tools have improved to enable first-pass design success in some cases, the potential benefits of optimization techniques become even more significant. This paper discusses methods for optimization of electron guns as well as multistage depressed collectors.
  • Keywords
    electron guns; optimisation; vacuum microelectronics; MICHELLE/ANALYST environment; automated physics-based optimization; depressed collectors design; electron guns; submillimeter wavelengths; vacuum electron devices; Algorithm design and analysis; Design automation; Design optimization; Electromagnetic analysis; Electron guns; Finite element methods; Frequency; Geometry; Magnetic analysis; Manufacturing; ANALYST; MICHELLE; collector optimization; gun optimization;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Electronics Conference, 2008. IVEC 2008. IEEE International
  • Conference_Location
    Monterey, CA
  • Print_ISBN
    978-1-4244-1715-5
  • Type

    conf

  • DOI
    10.1109/IVELEC.2008.4556401
  • Filename
    4556401