DocumentCode
2005285
Title
Characterization of osmium-ruthenium coatings for porous tungsten dispenser cathodes
Author
Balk, T. John ; Li, Wen-Chung ; Roberts, Scott
Author_Institution
Dept. of Chem. & Mater. Eng., Kentucky Univ., Lexington, KY
fYear
2008
fDate
22-24 April 2008
Firstpage
42
Lastpage
43
Abstract
Dispenser cathodes serve as electron sources in numerous vacuum devices, including traveling wave tubes and cathode ray tubes. These devices find use in commercial, military and space applications, requiring a long and reliable operating lifetime, especially for space-based operation. Semicon Associates, in Lexington, KY, leads this market, producing over 20,000 dispenser cathodes annually. The cathodes comprise several materials, including platinum group metal coatings that add significant production cost. It is not yet understood how the microstructure of these precious metal films affects cathode performance. Fundamental understanding of microstructure-property relationships in the coating could improve device performance and allow more economical use of the precious metals.
Keywords
cathodes; coatings; crystal microstructure; osmium alloys; porous materials; ruthenium alloys; tungsten; OsRu; W; device performance; electron sources; metal films affects cathode performance; microstructure property relationships; osmium ruthenium coatings; platinum group metal coatings; porous tungsten dispenser cathodes; Cathode ray tubes; Coatings; Costs; Electron sources; Electron tubes; Inorganic materials; Platinum; Production; Space exploration; Tungsten; microstructure; osmium ruthenium; thin film;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics Conference, 2008. IVEC 2008. IEEE International
Conference_Location
Monterey, CA
Print_ISBN
978-1-4244-1715-5
Type
conf
DOI
10.1109/IVELEC.2008.4556406
Filename
4556406
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