• DocumentCode
    2005285
  • Title

    Characterization of osmium-ruthenium coatings for porous tungsten dispenser cathodes

  • Author

    Balk, T. John ; Li, Wen-Chung ; Roberts, Scott

  • Author_Institution
    Dept. of Chem. & Mater. Eng., Kentucky Univ., Lexington, KY
  • fYear
    2008
  • fDate
    22-24 April 2008
  • Firstpage
    42
  • Lastpage
    43
  • Abstract
    Dispenser cathodes serve as electron sources in numerous vacuum devices, including traveling wave tubes and cathode ray tubes. These devices find use in commercial, military and space applications, requiring a long and reliable operating lifetime, especially for space-based operation. Semicon Associates, in Lexington, KY, leads this market, producing over 20,000 dispenser cathodes annually. The cathodes comprise several materials, including platinum group metal coatings that add significant production cost. It is not yet understood how the microstructure of these precious metal films affects cathode performance. Fundamental understanding of microstructure-property relationships in the coating could improve device performance and allow more economical use of the precious metals.
  • Keywords
    cathodes; coatings; crystal microstructure; osmium alloys; porous materials; ruthenium alloys; tungsten; OsRu; W; device performance; electron sources; metal films affects cathode performance; microstructure property relationships; osmium ruthenium coatings; platinum group metal coatings; porous tungsten dispenser cathodes; Cathode ray tubes; Coatings; Costs; Electron sources; Electron tubes; Inorganic materials; Platinum; Production; Space exploration; Tungsten; microstructure; osmium ruthenium; thin film;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Electronics Conference, 2008. IVEC 2008. IEEE International
  • Conference_Location
    Monterey, CA
  • Print_ISBN
    978-1-4244-1715-5
  • Type

    conf

  • DOI
    10.1109/IVELEC.2008.4556406
  • Filename
    4556406