• DocumentCode
    2007130
  • Title

    A higher dimensional theory of electrical contact resistance

  • Author

    Tang, Wilkin ; Lau, Y.Y.

  • Author_Institution
    Dept. of Nucl. Eng. & Radiol. Sci., Univ. of Michigan, Ann Arbor, MI
  • fYear
    2008
  • fDate
    22-24 April 2008
  • Firstpage
    212
  • Lastpage
    212
  • Abstract
    The electrical contact resistance is computed for a local constriction of finite length and finite transverse dimension in a conducting current channel. Conformal mapping is used for the case of a rectangular channel. An analytic scaling law is constructed for the contact resistance over a wide range of aspect ratios between the constriction and the main current channel. The classical theory of Holm and Timsit is generalized to include finite length effects of the ldquoa-spotrdquo, defined as a small circular area of zero thickness through which current can flow. Potential applications and extensions of the theory are indicated.
  • Keywords
    conformal mapping; contact resistance; Holm-Timsit theory; analytic scaling law; conformal mapping; electrical contact resistance; finite length dimension; finite transverse dimension; higher dimensional theory; wafer evaluation; Bridges; Cathodes; Contact resistance; Electric resistance; Electromagnetic heating; Rough surfaces; Surface contamination; Surface resistance; Surface roughness; Wire; contacts; resistance; wafer evaluation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Electronics Conference, 2008. IVEC 2008. IEEE International
  • Conference_Location
    Monterey, CA
  • Print_ISBN
    978-1-4244-1715-5
  • Type

    conf

  • DOI
    10.1109/IVELEC.2008.4556501
  • Filename
    4556501