Title :
Microelectromagnetic matrix for local assembling of magnetic nanoparticles
Author :
Luby, S. ; Chitu, L. ; Majkova, E. ; Senderak, R. ; Kostic, J. ; Hrkut, P. ; Matay, L. ; Hascik, S. ; Lalinsky, T. ; Capek, I. ; Satka, A.
Author_Institution :
Inst. of Phys., Slovak Acad. Sci., Bratislava
Abstract :
Microelectromagnetic matrix fabricated by lithography patterning on Si chip for the manipulation and assembling of nanoparticles (NP) by local magnetic field created by current loaded thin film conductors is described. Co, Fe3O4 and CoFe2O4 NPs are manipulated by matrix elements - meanders, grids and ring traps loaded at the electromigration limit of Ag conductors. The design of matrix is based on calculations of magnetic field over the elements covered by polyimide layer. Amorphous silicon is used as a manipulation surface
Keywords :
assembling; cobalt compounds; electromigration; elemental semiconductors; iron compounds; magnetic particles; nanolithography; nanoparticles; nanopatterning; silicon; silver; Ag; CoFe2O4; Fe3O4; Si; amorphous silicon; assembling; electromigration limit; lithography patterning; local magnetic field; magnetic nanoparticles; microelectromagnetic matrix; polyimide layer; silicon chip; silver conductors; thin film conductors; Amorphous magnetic materials; Assembly; Conductive films; Electromigration; Iron; Lithography; Magnetic fields; Magnetic films; Nanoparticles; Semiconductor thin films;
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 2006. ASDAM '06. International Conference on
Conference_Location :
Smolenice Castle
Print_ISBN :
1-4244-0369-0
DOI :
10.1109/ASDAM.2006.331141
