DocumentCode

2008610

Title

Influence of Under-Metal Planes on Al

Author

Shibata, H. ; Ikeda, N. ; Murota, M. ; Asahi, Y. ; Hashimoto, K.

Author_Institution

TOSHIBA Microelectronics Corporation, Japan

fYear

1991

fDate

28-30 May 1991

Firstpage

33

Lastpage

34

Keywords

Annealing; Argon; Conductors; Crystallography; Grain boundaries; Optical films; Stress; Surface treatment; Tin; X-ray diffraction;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1991. Digest of Technical Papers., 1991 Symposium on

Conference_Location

Oiso, Japan

Type

conf

DOI

10.1109/VLSIT.1991.705976

Filename

705976