DocumentCode
2008717
Title
Interconnect technologies for SmartPower integrated circuits in the area of automotive power applications
Author
Stecher, M. ; Nelle, P. ; Busch, J. ; Alpern, P.
Author_Institution
Infineon Technol. AG, Neubiberg, Germany
fYear
2011
fDate
8-12 May 2011
Firstpage
1
Lastpage
3
Abstract
In this article the metallization schemes of output DMOS drivers for automotive SmartPower integrated circuits (ICs) are discussed. In contrast to non-automotive applications the main concern is the thermal-mechanical stability of the metallization during inductive switching which leads to high thermal pulses within the metallization. These pulses can result in junction temperatures above 400°C. Additionally, automotive ICs used in under-hood applications encounter rough and fast environmental changes. Rapid junction temperatures changes between -40°C and 175°C result in high mechanical shear stresses within the metallization so that the dielectrics in the metallization can crack. In both cases the thermal-mechanical properties of the chip metallization can be improved by introducing new materials like 11μm thick copper layers on top of the chip for increasing the thermal capacitance of the DMOS and/or material additions within the aluminum to improve its stiffness.
Keywords
MOS integrated circuits; automotive electronics; integrated circuit interconnections; integrated circuit metallisation; automotive SmartPower integrated circuits; automotive power applications; chip metallization; inductive switching; interconnect technologies; mechanical shear stresses; metallization schemes; output DMOS drivers; thermal-mechanical stability; Aluminum; Clamps; Copper; Metallization; Stress; Switches;
fLanguage
English
Publisher
ieee
Conference_Titel
Interconnect Technology Conference and 2011 Materials for Advanced Metallization (IITC/MAM), 2011 IEEE International
Conference_Location
Dresden
ISSN
pending
Print_ISBN
978-1-4577-0503-8
Type
conf
DOI
10.1109/IITC.2011.5940264
Filename
5940264
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