DocumentCode :
2008783
Title :
Doping effect of metal into iron disilicide on electronic structures and thermoelectric properties
Author :
Sugihara, S. ; Kawashima, S. ; Katanahara, H. ; Suzuki, H. ; Mochizuki, S. ; Sekine, R.
Author_Institution :
Shonan Inst. of Technol., Fujisawa, Japan
fYear :
1999
fDate :
Aug. 29 1999-Sept. 2 1999
Firstpage :
577
Lastpage :
580
Abstract :
Doping effects of elements into FeSi/sub 2/ on the electronic structures were studied relating to the thermoelectric properties. The studied elements were the metals possessing d- or f-electrons such as Mn, Co, Zn and Hf, W, os (f/sup 14/ series) and Nd, Eu and Yb in the lanthanide series, although only Yb, Hf and Os are reported here. The calculation was performed using the discrete variational X/spl alpha/ molecular orbital method. The energy gap between the highest occupied molecular orbital (HOMO) and the lowest unoccupied molecular orbital (LUMO) relates to electrical conductivity, and the Seebeck coefficient associated with the gap between HOMO and LUMO levels possessing the same symmetry which were degenerate. In experiment, doping with Yb/sub 2/O/sub 3/ increased the Seebeck coefficient and electrical resistivity did not change much, resulting in an improvement as large as twice the figure of merit for thermoelectricity.
Keywords :
Seebeck effect; Xalpha calculations; electrical resistivity; energy gap; iron compounds; semiconductor materials; FeSi/sub 2/; HOMO-LUMO energy gap; Seebeck coefficient; discrete variational X/spl alpha/ calculations; electrical conductivity; electronic structure; figure of merit; thermoelectricity; Conducting materials; Doping; Electric resistance; Hafnium; Iron; Neodymium; Orbital calculations; Thermal conductivity; Thermoelectricity; Zinc;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Thermoelectrics, 1999. Eighteenth International Conference on
Conference_Location :
Baltimore, MD, USA
ISSN :
1094-2734
Print_ISBN :
0-7803-5451-6
Type :
conf
DOI :
10.1109/ICT.1999.843455
Filename :
843455
Link To Document :
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