DocumentCode :
2009332
Title :
Epitaxial bismuth telluride layers grown on [111] barium fluoride substrates suitable for MQW-growth
Author :
Nurnus, Joachim ; Böttner, H. ; Beyer, H. ; Lambrecht, A.
Author_Institution :
Fraunhofer Inst. Phys. Messtech., Freiburg, Germany
fYear :
1999
fDate :
Aug. 29 1999-Sept. 2 1999
Firstpage :
696
Lastpage :
699
Abstract :
Multi quantum wells and superlattices are discussed as suitable tools for increasing ZT. Best layer quality should be expected only for lattice matched growth. Therefore [111] barium fluoride should be most suitable compared to other common substrates like mica and sapphire, although up to now epitaxial growth of bismuth telluride on [111] barium fluoride with atomically flatness was not achieved. We present the first bismuth telluride-layers reproducibly prepared on [111] barium fluoride substrates using the molecular beam technique. Three essential factors influence the growth of bismuth telluride on barium fluoride: substrate temperature, the flux ratio of Bi/Te and substrate surface preparation itself even for single crystal [111] barium fluoride substrates. These dependencies of growth characteristics and layer properties are reported. AFM and RHEED analysis show suitable layer by layer growth of bismuth telluride with step height of 1 nm as expected from its crystal structure. Step widths of growth terraces are similar to those known from other MQW-suitable systems like IV-VI-compounds. Further X-ray analysis combined with EDX-analysis (single crystals standard) indicates single phase growth with stable stochiometric composition.
Keywords :
X-ray chemical analysis; atomic force microscopy; bismuth compounds; molecular beam epitaxial growth; reflection high energy electron diffraction; semiconductor epitaxial layers; semiconductor growth; semiconductor materials; semiconductor quantum wells; semiconductor superlattices; thermoelectricity; AFM; BaF/sub 2/; BaF/sub 2/[111] substrates; Bi/sub 2/Te/sub 3/; EDX-analysis; RHEED; epitaxial layers; flux ratio; growth terraces; layer by layer growth; layer quality; molecular beam epitaxy; multi quantum wells; single phase growth; stochiometric composition; substrate surface preparation; substrate temperature; superlattices; Atomic layer deposition; Barium; Bismuth; Epitaxial growth; Lattices; Molecular beam epitaxial growth; Substrates; Superlattices; Tellurium; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Thermoelectrics, 1999. Eighteenth International Conference on
Conference_Location :
Baltimore, MD, USA
ISSN :
1094-2734
Print_ISBN :
0-7803-5451-6
Type :
conf
DOI :
10.1109/ICT.1999.843481
Filename :
843481
Link To Document :
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