DocumentCode :
2009404
Title :
Electronic structure of Sb/sub 2/Te/sub 3/ under pressure
Author :
Bartkowiak, M. ; Mahan, G.D.
Author_Institution :
Dept. of Phys. & Astron., Tennessee Univ., Knoxville, TN, USA
fYear :
1999
fDate :
Aug. 29 1999-Sept. 2 1999
Firstpage :
713
Lastpage :
716
Abstract :
Recent experimental data indicate that thermoelectric properties of alloys commonly used in room-temperature cooling devices, Sb/sub 2/Te/sub 3/ and Bi/sub 2/Te/sub 3/, improve significantly under pressure. Here we analyze the structure and the electronic properties of Sb/sub 2/Te/sub 3/ under pressure within the framework of density functional theory using the relativistic version of the full potential linearized augmented plane wave (FP-LAPW) method. We use an approach that does not require any external input. First, we calculate the crystallographic parameters as a function of pressure and show that the results are in reasonable agreement with the available experimental data. Then, we calculate the electronic band structure of the material under pressure and discuss its properties. It is shown that the band gap of Sb/sub 2/Te/sub 3/ reduces under pressure and closes completely at about 2 GPa. This is consistent with the experimental data on the resistivity. Other details of the pressure dependence of the band structure are also discussed.
Keywords :
APW calculations; antimony compounds; crystal structure; density functional theory; energy gap; high-pressure effects; semiconductor materials; FP-LAPW method; Sb/sub 2/Te/sub 3/; band gap; crystal structure; density functional theory; electronic band structure; pressure dependence; Bismuth; Crystalline materials; Crystallography; Density functional theory; Electronics cooling; Photonic band gap; Tellurium; Thermoelectric devices; Thermoelectricity; Tin alloys;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Thermoelectrics, 1999. Eighteenth International Conference on
Conference_Location :
Baltimore, MD, USA
ISSN :
1094-2734
Print_ISBN :
0-7803-5451-6
Type :
conf
DOI :
10.1109/ICT.1999.843485
Filename :
843485
Link To Document :
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