Title :
Dependence of Thin Oxide Films Quality on Surface Micro-Roughness
Author :
Miyashita, M. ; Itano, M. ; Imaoka, T. ; Kawanabe, I. ; Ohmi, T.
Author_Institution :
Department of Electronics, Tohoku University, Japan
Keywords :
Dielectric breakdown; Electric breakdown; Electric variables measurement; Electrodes; Rough surfaces; Silicon; Surface cleaning; Surface contamination; Surface roughness; Surface treatment;
Conference_Titel :
VLSI Technology, 1991. Digest of Technical Papers., 1991 Symposium on
Conference_Location :
Oiso, Japan
DOI :
10.1109/VLSIT.1991.705982
