Improving plasma characteristic and depositing high-quality diamond film in surface wave plasma CVD

Summary form only given, as follows. By plasma chemical vapor deposition (CVD), a diamond film has been deposited in a hydrogen based plasma typically at a low pressure of several tens Torr. Recently, however, to deposit a large-area diamond film at a lower deposition temperature, a diamond film deposition at a lower pressure under 1 Torr has been attracting attentions. To deposit a high quality diamond at such a lower pressure, a plasma source with a high electron density, a low electron temperature, and a low plasma space potential has been demanded.