DocumentCode
2010998
Title
Reliability testing and Failure Analysis of 3D integrated systems
Author
Klumpp, Armin ; Ramm, Peter ; Franz, German ; Rue, Chad ; Kwakman, Laurens
Author_Institution
Fraunhofer EMFT, Munich, Germany
fYear
2011
fDate
8-12 May 2011
Firstpage
1
Lastpage
3
Abstract
3D integration comes with the introduction of many new processes and materials that may affect behavior and reliability of the overall system. For reliability testing of 3D integration technologies a 3-level test chip has been designed that includes Through Silicon Vias (TSV´s) and assembly layers and that allows evaluation of yield and electrical parameters under steady state (DC) and RF signal conditions. Additionally, this (stacked) chip delivers reliability values when used within the standardized procedures defined by JDEC. Subsequent Physical Failure Analysis has been performed using a novel plasma-FIB system that allows efficient chip access and first line analysis thanks to its high mill rates and good image resolution. In this paper, the test chip design, reliability testing and physical analysis details will be presented.
Keywords
failure analysis; integrated circuit interconnections; integrated circuit reliability; integrated circuit testing; three-dimensional integrated circuits; 3-level test chip; 3D integrated systems; 3D integration; assembly layers; electrical parameters; physical analysis; physical failure analysis; plasma-FIB system; reliability testing; test chip design; through silicon vias; Iterative closest point algorithm; Materials; Milling; Reliability; Testing; Three dimensional displays; Through-silicon vias;
fLanguage
English
Publisher
ieee
Conference_Titel
Interconnect Technology Conference and 2011 Materials for Advanced Metallization (IITC/MAM), 2011 IEEE International
Conference_Location
Dresden
ISSN
pending
Print_ISBN
978-1-4577-0503-8
Type
conf
DOI
10.1109/IITC.2011.5940362
Filename
5940362
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