DocumentCode :
2011481
Title :
Effect of rate of current rise on the discharge uniformity: a two-dimensional simulation
Author :
Bychkov, Yu.I. ; Yampolskaya, S.A. ; Yastremsky, A.G.
Author_Institution :
Inst. of High-Current Electron., Acad. of Sci., Tomsk, Russia
fYear :
2003
fDate :
5-5 June 2003
Firstpage :
160
Abstract :
Summary form only given, as follows. We report results of computer simulations of the development of a high-pressure discharge with several plasma channels. In simulations hot spots were initiated by small metal convexities at the cathode surface with a characteristic dimension of /spl sim/0.1 cm. The convexities cause the local electric field to be non-uniform. The convexity size determines degree of such a non-uniformity. It was shown that if the neighboring convexities have different size the total current switches to a larger plasma channel. Other channels vanish. With the increasing rate of the current rise all diffuse channels develop simultaneously. This takes place due to a fast increase of the electron density and depletion of the HCl molecules in the whole channel volume. Thus the improvement of the discharge uniformity can be achieved by an appropriate choice of the pumping regime.
Keywords :
current density; gas mixtures; glow discharges; plasma density; plasma simulation; computer simulations; convexity size; current density; current rise rate; diffuse channels; discharge uniformity; electron density; gas mixture; high-pressure discharges; hot spots; plasma channels; pumping regime; Cathodes; Computational modeling; Computer simulation; Electrons; Nonuniform electric fields; Plasma density; Plasma properties; Plasma simulation; Surface discharges; Switches;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
ISSN :
0730-9244
Print_ISBN :
0-7803-7911-X
Type :
conf
DOI :
10.1109/PLASMA.2003.1228605
Filename :
1228605
Link To Document :
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