• DocumentCode
    2012043
  • Title

    Coaxial tip piezoresistive scanning probes for high-resolution electrical imaging

  • Author

    Harjee, N. ; Garcia, A.G.F. ; König, M. ; Doll, J.C. ; Goldhaber-Gordon, D. ; Pruitt, B.L.

  • Author_Institution
    Stanford Univ., Stanford, CA, USA
  • fYear
    2010
  • fDate
    24-28 Jan. 2010
  • Firstpage
    344
  • Lastpage
    347
  • Abstract
    We have designed and batch fabricated silicon cantilever scanning probes integrating, for the first time, a coaxial tip to produce highly localized electric fields and a piezoresistor to measure cantilever deflection. These probes will improve the lateral resolution of scanning gate microscopy enabling the study of electron organization in semiconductor nanostructures. The full-width at half-maximum of the perturbation produced by our coaxial tip is ~3x smaller than that of conventional tips. At 300 K, the vertical displacement resolution of a 405 ¿m long probe is 2.4 nm in a 1 kHz bandwidth. With the ability to image topography and apply local electric fields, our probe has broad applications including electromechanical studies of cells and dopant profiling in semiconductors.
  • Keywords
    atomic force microscopy; cantilevers; imaging; mechanical variables measurement; microfabrication; microsensors; piezoresistive devices; batch fabricated silicon cantilever scanning probes; coaxial tip piezoresistive scanning probes; dopant profiling; electromechanical studies; electron organization; high-resolution electrical imaging; image topography; local electric fields; scanning gate microscopy; semiconductor nanostructures; vertical displacement resolution; Bandwidth; Coaxial components; Electric variables measurement; High-resolution imaging; Piezoresistance; Probes; Scanning electron microscopy; Semiconductor nanostructures; Silicon; Time measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems (MEMS), 2010 IEEE 23rd International Conference on
  • Conference_Location
    Wanchai, Hong Kong
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4244-5761-8
  • Electronic_ISBN
    1084-6999
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2010.5442494
  • Filename
    5442494