• DocumentCode
    2013399
  • Title

    Unified characterization of RTN and BTI for circuit performance and variability simulation

  • Author

    Ayala, N. ; Martin-Martinez, J. ; Rodriguez, R. ; Nafria, M. ; Aymerich, X.

  • Author_Institution
    Dept. d´´Eng. Electron., Univ. Autonoma de Barcelona (UAB), Barcelona, Spain
  • fYear
    2012
  • fDate
    17-21 Sept. 2012
  • Firstpage
    266
  • Lastpage
    269
  • Abstract
    In small devices, Bias Temperature Instability (BTI) produces discrete threshold voltage (VT) shifts, which are attributed to the charge and discharge of single defects. In this work, the voltage and temperature dependences of charging/discharging of individual defects, considering their stochastic behavior, have been analyzed. From the results, and considering a previously presented BTI physics-based model, the corresponding VT shifts in the device have been obtained and included in a circuit simulator, to evaluate their effects on SRAM cells performance and variability.
  • Keywords
    MOSFET; SRAM chips; circuit simulation; stochastic processes; BTI physics-based model; MOSFET; RTN; SRAM cells performance; bias temperature instability; circuit performance; circuit simulator; discrete threshold voltage shift; stochastic behavior; unified characterization; variability simulation; Discharges (electric); Integrated circuit modeling; Logic gates; MOSFETs; Random access memory; Temperature dependence; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference (ESSDERC), 2012 Proceedings of the European
  • Conference_Location
    Bordeaux
  • ISSN
    1930-8876
  • Print_ISBN
    978-1-4673-1707-8
  • Electronic_ISBN
    1930-8876
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2012.6343384
  • Filename
    6343384