DocumentCode
2013399
Title
Unified characterization of RTN and BTI for circuit performance and variability simulation
Author
Ayala, N. ; Martin-Martinez, J. ; Rodriguez, R. ; Nafria, M. ; Aymerich, X.
Author_Institution
Dept. d´´Eng. Electron., Univ. Autonoma de Barcelona (UAB), Barcelona, Spain
fYear
2012
fDate
17-21 Sept. 2012
Firstpage
266
Lastpage
269
Abstract
In small devices, Bias Temperature Instability (BTI) produces discrete threshold voltage (VT) shifts, which are attributed to the charge and discharge of single defects. In this work, the voltage and temperature dependences of charging/discharging of individual defects, considering their stochastic behavior, have been analyzed. From the results, and considering a previously presented BTI physics-based model, the corresponding VT shifts in the device have been obtained and included in a circuit simulator, to evaluate their effects on SRAM cells performance and variability.
Keywords
MOSFET; SRAM chips; circuit simulation; stochastic processes; BTI physics-based model; MOSFET; RTN; SRAM cells performance; bias temperature instability; circuit performance; circuit simulator; discrete threshold voltage shift; stochastic behavior; unified characterization; variability simulation; Discharges (electric); Integrated circuit modeling; Logic gates; MOSFETs; Random access memory; Temperature dependence; Temperature measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference (ESSDERC), 2012 Proceedings of the European
Conference_Location
Bordeaux
ISSN
1930-8876
Print_ISBN
978-1-4673-1707-8
Electronic_ISBN
1930-8876
Type
conf
DOI
10.1109/ESSDERC.2012.6343384
Filename
6343384
Link To Document