Title :
Development of an MgO sputtering system for the plasma display panel
Author :
Young Wook Choi ; Jee Hyun Kim
Author_Institution :
Korea Electrotechnol. Res. Inst., Changwon, South Korea
Abstract :
Summary form only given, as follows. MgO sputtering system for the plasma display panel application has being developed. This system is manufactured with a vertical in-line type of 42 inch. The reactive magnetron discharge is applied for the MgO thin film deposition using unipolar power source of 10-150 kHz. To understand the characteristics of this system, a fundamental experiment is being carried out under the several plasma conditions.
Keywords :
magnesium compounds; plasma displays; sputter deposition; 10 to 150 kHz; 42 inch; MgO; plasma display panel; reactive magnetron discharge; sputtering system; thin film deposition; Electron emission; Fault location; Manufacturing; Plasma displays; Plasma materials processing; Plasma measurements; Plasma properties; Plasma sources; Protection; Sputtering;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1228728
