Microwave plasma jet for material processing of high temperature ceramics

Author

Al-Shamma´a, A.I. ; Wylie, W.R. ; Lucas, J.

Author_Institution

Dept. of Electr. Eng. & Electron., Liverpool Univ., UK

fYear

2003

fDate

5-5 June 2003

Firstpage

233

Abstract

Summary form only given, as follows. This paper describes the design parameters of a system operating at 2.45 GHz, a waveguide based applicator to generate a microwave plasma jet (MPJ) at atmospheric pressure. The plasma is formed by the interaction of a high electrical field, generated by the microwave power, between the waveguide aperture and the gas nozzle. A variety of gases have been used to produce the plasma including argon, helium and nitrogen. This paper also discusses the effects of various parameters on the plasma jet including the type of the gas, flow rate, the speed of the ceramic rod, the input power and the nozzle design.

Keywords

plasma jets; plasma materials processing; 2.45 GHz; Ar; He; N; high temperature ceramics; microwave plasma jet; nozzle; waveguide based applicator; Applicators; Atmospheric waves; Atmospheric-pressure plasmas; Ceramics; High power microwave generation; Microwave generation; Plasma materials processing; Plasma temperature; Plasma waves; Power generation;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on

Conference_Location

Jeju, South Korea

ISSN

0730-9244

Print_ISBN

0-7803-7911-X

Type

conf

DOI

10.1109/PLASMA.2003.1228740

Filename

1228740