DocumentCode
2015005
Title
Excitation-dependent blue shift of photoluminescence peak in 1.5–1.6 µm wavelength region from dislocation-rich Si layers
Author
Shklyaev, Alexander A. ; Gorbunov, Andrei V. ; Ichikawa, Masakazu
Author_Institution
Inst. of Semicond. Phys., SB RAS, Novosibirsk, Russia
fYear
2010
fDate
June 30 2010-July 4 2010
Firstpage
59
Lastpage
63
Abstract
We study photoluminescence (PL) from dislocation-rich Si layers prepared by Si growth on the nanostructured surface composed of dense arrays of Ge islands grown on the oxidized Si surface. The Si layers exhibit intense PL centered in the 1.5-1.6 wavelength region. The PL is associated with dislocations, which have an extremely high concentration according to transmission electron microscopy data. Using a probable model of electronic structure of dislocated silicon, we assume that the radiative transitions occur between the dislocation-induced conduction sub-band and deep levels located about 0.3 eV above the valence band edge. We found that the dislocation-related PL peak is blue-shifted under high excitation conditions. The shift is considered to be an evidence of carrier transfer between the deep states. We calculate the occupancy of the deep states as a function of the pump power density using the model with non-interacting deep states and find that the occupancy and the PL peak have the similar excitation behavior.
Keywords
conduction bands; deep levels; dislocation density; elemental semiconductors; excited states; nanostructured materials; nonradiative transitions; photoluminescence; semiconductor epitaxial layers; semiconductor growth; silicon; spectral line shift; transmission electron microscopy; valence bands; Si; carrier transfer; deep state occupancy; dense Ge island arrays; dislocated silicon; dislocation concentration; dislocation-induced conduction deep levels; dislocation-induced conduction subband levels; dislocation-rich Si layers; electronic structure probable model; excitation-dependent photoluminescence peak blue shift; nanostructured surface; noninteracting deep states; oxidized Si surface; pump power density; radiative transitions; transmission electron microscopy; valence band edge; wavelength 1.5 mum to 1.6 mum; Epitaxial growth; Silicon; Si nanostructures; carrier recombination processes; photoluminescence;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro/Nanotechnologies and Electron Devices (EDM), 2010 International Conference and Seminar on
Conference_Location
Novosibirsk
Print_ISBN
978-1-4244-6626-9
Type
conf
DOI
10.1109/EDM.2010.5568664
Filename
5568664
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